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HnSiCl4-n;n=0,1,2,3

Mar 17, 2017

Silane SiH4 in the hydrogen atoms arereplaced by chlorine atoms, the total known as chlorosilane, low chlorinecontent when the gas, the higher the liquid, colorless or yellow, N = 0, 1, 2,3;

Chlorosilane with active hydrogen compoundswith a fierce reaction, such as water, alcohols, phenols, silanol, organicacids, etc., release hydrogen chloride.

With the organometallic compounds, chlorineatoms are replaced by the corresponding organic groups to generateorganochlorosilane or organosilane.

The silicon powder and hydrogen chloride at290 ~ 400 ° C reaction to the system can also be a mixture of silicon powderand hydrogen and hydrogen chloride in the presence of cuprous chloride, 250 ° Cin response to the system.

Silicon epitaxial wafers used in theproduction process of silicon source and the preparation of organochlorosilaneraw materials.

In addition, silicon tetrachloride (SiCl4)and trichlorosilane (HSiCl3) is an intermediate for the extraction of highpurity silicon. After fractionation, 99.999999999% (eleven 9) purity siliconcan be obtained.

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